Own and optimize the inspection–review–repair (IRP) workflow for photomask manufacturing.
Analyze inspection data to identify defect trends, paretos, and excursion drivers.
Develop and maintain real-time defect monitoring (RDA) systems and dashboards.
Drive root cause analysis and corrective actions for yield and defect excursions.
Partner with inspection and metrology teams to improve defect detection sensitivity and classification accuracy.
Evaluate defect printability and impact to support disposition decisions (repair vs accept vs scrap).
Support qualification and optimization of inspection, review, and repair tools.
Apply SPC, DOE, and statistical analysis to improve process robustness.
Collaborate with process, equipment, and manufacturing teams to improve yield, cycle time, and cost.
Document defect mechanisms, control strategies, and process improvements.
Requirements
5-7 years of hands-on experience in semiconductor manufacturing, photolithography, photomask engineering.
3+ years of experience in semiconductor, photomask, or advanced microfabrication manufacturing, with direct experience in photolithography or patterning processes.
Hands-on experience with lithography process development and troubleshooting in a cleanroom or manufacturing environment.
Strong understanding of photolithography and patterning processes
Ability to interpret large datasets and drive actionable insights
Experience with inspection, defect analysis, or yield engineering
Experience with SPC, data analysis, and root cause methodologies.
Familiarity with Cleanroom operations.
Experience qualifying new tools, materials, or recipes in R&D and/or high-volume manufacturing, a plus.
Experience with scripting, automation, or data analysis tools, a plus.